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BALD Engineering News Blog

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Probably The Best ALD news blog. Covering new and old developments in Atomic Layer Deposition and Technology. From BALD Engineering:

jonas.sundqvist@baldengineering.com

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2014.02.06 - The 4th IPMS-CNT Industry Partner Day

WorkshopsPosted by Jonas 2014-01-12 00:02:42

Fraunhofer IPMS-CNT cordially invite to "Nanoelectronic Technologies for Future Smart Systems" in Dresden. This time with high-level speakers from Globalfoundries, IBM, Infineon, IMEC and JSR Mirco. Full program and online registration behind the link.

Get Together & CNT Clean Room Window Tour (limited capacity!)

http://www.cnt.fraunhofer.de/en/Events_Press/events_trade_fairs/cnt_research_day12.html

Programm & Schedule:


8:30 a.m. -Registration-
9:00 a.m. WelcomeProf. Dr. Hubert Lakner, Director Fraunhofer IPMS, Chairman Fraunhofer Group Microelectronics
9:15 a.m. Cooperation is Key - R&D perspectives at Globalfoundries Dresden, Dr. Manfred Horstmann, Director Technology & Integration, Device - Globalfoundries
9:45 a.m. Made in Dresden - Infineon Today & Tomorrow, Dr. Norbert Thyssen, Director Customer Services / Dvmt. Projects - Infineon
10:15 a.m. Coffee Break

Session: Devices in Back-End-of-Line

10:40 a.m.Challenges for 28 nm BEOL, Thomas Werner, Manager Technology & Integration Engineering - Globalfoundries
11:05 a.m. Chemical screening for CMP applications, Peter Bridger, CMP Project Manager - JSR Micro, Belgium
11:30 a.m. CNT as test bed for chemical screening, Dr. Benjamin Uhlig, Fraunhofer IPMS-CNT Interconnects
11:55 a.m. High-k 3DMIM-Cap Devices, Dr. Wenke Weinreich, Fraunhofer IPMS-CNT High-k Devices
12:20 p.m.-Lunch Break-

Session: Logic & Memory Scaling

1:00 p.m. New front-end materials for continued CMOS logic scaling, Dr. Martin M. Frank, BM Research/New York
1:25 p.m. RRAM - Challenges and Opportunities of an Emerging Memory, Dr. Malgorzata Jurczak, Director Emerging Memory Devices - IMEC Belgium
1:50 p.m. A CMOS-compatible and highly scalable approach to future ferroelectric memories, Johannes Müller, FraunhoferIPMS-CNT High-k Devices)
2:15 p.m. -Short Coffee Break-

Session: MEMS, Passives & Nanopatterning

2:25 p.m. Nanopatterning using alternative Litho, Dr. Christoph Hohle, Fraunhofer IPMS-CNT Nanopatterning
2:50 p.m. MEMS-Technology at Fraunhofer IPMS, Dr. Michael Müller, IPMS MEMS Sensors)
3:15 p.m. -End of Program-



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